US Patent 7207339 Method for cleaning a plasma enhanced CVD chamber
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Patent abstract
A method for plasma cleaning a CVD reactor chamber including providing a plasma enhanced CVD reactor chamber comprising residual deposited material; performing a first plasma process comprising an oxygen containing plasma; performing a second plasma process comprising an argon containing plasma; and, performing a third plasma process comprising a fluorine containing plasma.
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US Patent 07207339 Method for cleaning a plasma enhanced CVD chamber US Patent 7207339 Method for cleaning a plasma enhanced CVD chamber
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Patent Number
0720733900
Patent Number
720733900
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Is a
Patent Jurisdiction
Patent Number
072073390
Date of Patent
April 24, 2007
0Patent Application Number
107387400
Date Filed
December 17, 2003
0Official Website
Patent Primary Examiner
Edits on 25 Sep, 2022
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Infobox
Is a
Patent Jurisdiction
Patent Number
072073390
Date of Patent
April 24, 2007
0Patent Application Number
107387400
Date Filed
December 17, 2003
0Official Website
Patent Primary Examiner
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US Patent 07207339 Method for cleaning a plasma enhanced CVD chamber
Infobox
Is a
Patent jurisdiction
Patent number
07207339
Date of patent
April 24, 2007
Patent application number
10738740
Date Filed
December 17, 2003
Patent primary examiner
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