Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
May 1, 2007
Patent Application Number
11252476
Date Filed
October 18, 2005
Patent Primary Examiner
Patent abstract
The invention relates to a method for producing phase shifter masks for 157 nm lithography. A coating has an organic material and is at least partially configured on the phase shifter mask. This coating is processed with an electron beam. This allows efficient production of very small structures, even for 157 nm lithography.
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