Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
May 15, 2007
Patent Application Number
10132001
Date Filed
April 24, 2002
Patent Primary Examiner
Patent abstract
An exposure method comprising the steps of forming onto a mask that arranges a pattern of a contact hole and a plurality of patterns each being smaller than the contact hole pattern, and illuminating the mask using plural kinds of light so as to resolve the desired pattern without the smaller patterns on a target via a projection optical system.
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