US Patent 7217503 Exposure method and apparatus
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Patent abstract
An exposure method comprising the steps of forming onto a mask that arranges a pattern of a contact hole and a plurality of patterns each being smaller than the contact hole pattern, and illuminating the mask using plural kinds of light so as to resolve the desired pattern without the smaller patterns on a target via a projection optical system.
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US Patent 07217503 Exposure method and apparatus US Patent 7217503 Exposure method and apparatus
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Patent Number
0721750300
Patent Number
721750300
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Is a
Patent Jurisdiction
Patent Number
072175030
Date of Patent
May 15, 2007
0Patent Application Number
101320010
Date Filed
April 24, 2002
0Official Website
Patent Primary Examiner
Edits on 27 Sep, 2022
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Infobox
Is a
Patent Jurisdiction
Patent Number
072175030
Date of Patent
May 15, 2007
0Patent Application Number
101320010
Date Filed
April 24, 2002
0Official Website
Patent Primary Examiner
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US Patent 07217503 Exposure method and apparatus
Infobox
Is a
Patent jurisdiction
Patent number
07217503
Date of patent
May 15, 2007
Patent application number
10132001
Date Filed
April 24, 2002
Patent primary examiner
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