Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
May 22, 2007
Patent Application Number
11445764
Date Filed
June 2, 2006
Patent Primary Examiner
Patent abstract
A photosensitive resin composition comprising:(d) at least one polybenzoxazole precursor polymer(e) at least one compound having structure VIV1—Y—V2 VIwherein Y is selected from S, O, NR2, (HOCH)p, and
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