US Patent 7220520 Photosensitive resin compositions
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Patent abstract
A photosensitive resin composition comprising:(d) at least one polybenzoxazole precursor polymer(e) at least one compound having structure VIV1—Y—V2 VIwherein Y is selected from S, O, NR2, (HOCH)p, and
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US Patent 07220520 Photosensitive resin compositions US Patent 7220520 Photosensitive resin compositions
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Patent Number
0722052000
Patent Number
722052000
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Patent Jurisdiction
Patent Number
072205200
Date of Patent
May 22, 2007
0Patent Application Number
114457640
Date Filed
June 2, 2006
0Official Website
Patent Primary Examiner
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Infobox
Is a
Patent Jurisdiction
Patent Number
072205200
Date of Patent
May 22, 2007
0Patent Application Number
114457640
Date Filed
June 2, 2006
0Official Website
Patent Primary Examiner
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US Patent 07220520 Photosensitive resin compositions
Infobox
Is a
Patent jurisdiction
Patent number
07220520
Date of patent
May 22, 2007
Patent application number
11445764
Date Filed
June 2, 2006
Patent primary examiner
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