Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
May 29, 2007
Patent Application Number
10910480
Date Filed
August 3, 2004
Patent Primary Examiner
Patent abstract
A megasonic immersion lithography exposure apparatus and method for substantially eliminating microbubbles from an exposure liquid in immersion lithography is disclosed. The apparatus includes an optical system for projecting light through a mask and onto a wafer.
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