US Patent 7224427 Megasonic immersion lithography exposure apparatus and method
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Patent abstract
A megasonic immersion lithography exposure apparatus and method for substantially eliminating microbubbles from an exposure liquid in immersion lithography is disclosed. The apparatus includes an optical system for projecting light through a mask and onto a wafer.
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US Patent 07224427 Megasonic immersion lithography exposure apparatus and method US Patent 7224427 Megasonic immersion lithography exposure apparatus and method
Infobox
Patent Number
0722442700
Patent Number
722442700
Edits on 29 Apr, 2023
Golden AI
Infobox
Is a
Patent Jurisdiction
Patent Number
072244270
Date of Patent
May 29, 2007
0Patent Application Number
109104800
Date Filed
August 3, 2004
0Official Website
Patent Primary Examiner
Edits on 28 Sep, 2022
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Infobox
Is a
Patent Jurisdiction
Patent Number
072244270
Date of Patent
May 29, 2007
0Patent Application Number
109104800
Date Filed
August 3, 2004
0Official Website
Patent Primary Examiner
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US Patent 07224427 Megasonic immersion lithography exposure apparatus and method
Infobox
Is a
Patent jurisdiction
Patent number
07224427
Date of patent
May 29, 2007
Patent application number
10910480
Date Filed
August 3, 2004
Patent primary examiner
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