US Patent 7247575 Multi-step EBR process for photoresist removal
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Patent abstract
An edge bead removal process is disclosed. The process includes providing a wafer having a feature layer, coating a photoresist on the feature layer, rotating the wafer, and removing an edge bead from the wafer by removing an edge bump portion from the edge bead and removing an edge region from the edge bead.
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US Patent 07247575 Multi-step EBR process for photoresist removal US Patent 7247575 Multi-step EBR process for photoresist removal
Infobox
Patent Number
0724757500
Patent Number
724757500
Edits on 23 Apr, 2023
Golden AI
Infobox
Is a
Patent Jurisdiction
Patent Number
072475750
Date of Patent
July 24, 2007
0Patent Application Number
108813400
Date Filed
June 30, 2004
0Official Website
Patent Primary Examiner
Edits on 26 Sep, 2022
Golden AI
Infobox
Is a
Patent Jurisdiction
Patent Number
072475750
Date of Patent
July 24, 2007
0Patent Application Number
108813400
Date Filed
June 30, 2004
0Official Website
Patent Primary Examiner
Edits on 15 Jun, 2022
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US Patent 07247575 Multi-step EBR process for photoresist removal
Infobox
Is a
Patent jurisdiction
Patent number
07247575
Date of patent
July 24, 2007
Patent application number
10881340
Date Filed
June 30, 2004
Patent primary examiner
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