US Patent 7251024 Defect inspection method and apparatus therefor
Patent 7251024 was granted and assigned to Hitachi on July, 2007 by the United States Patent and Trademark Office.
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Patent Inventor Names
Atsushi Yoshida0
Hiroaki Shishido0
Minoru Yoshida0
Sachio Uto0
Shunji Maeda0
Toshihiko Nakata0
Yukihiro Shibata0
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Patent abstract
A defect inspection apparatus for inspecting a fine circuit pattern with high resolution to detect a defective portion is constructed to have an objective lens for detecting an image of a sample, a laser illumination unit for illuminating the sample through the objective lens, a unit for reducing the coherence of the laser illumination, an accumulation type detector, and a unit for processing the detected image signal.
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US Patent 07251024 Defect inspection method and apparatus therefor US Patent 7251024 Defect inspection method and apparatus therefor
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Patent Number
072510240
Patent Number
72510240
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Official Website
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
072510240
Date of Patent
July 31, 2007
0Patent Application Number
109711090
Date Filed
October 25, 2004
0Official Website
Patent Primary Examiner
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US Patent 07251024 Defect inspection method and apparatus therefor
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07251024
Date of patent
July 31, 2007
Patent application number
10971109
Date Filed
October 25, 2004
Patent primary examiner
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