US Patent 7252925 Nitrogen-containing organic compound, resist composition and patterning process
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Patent Inventor Names
Akihiro Seki0
Katsuya Takemura0
Takeru Watanabe0
Takeshi Kinsho0
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Patent abstract
Resist compositions comprising nitrogen-containing organic compounds having a benzimidazole structure and a specific ether chain moiety have an excellent resolution, form precisely configured patterns with minimized roughness of sidewalls and are useful in microfabrication using electron beams or deep-UV light.
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US Patent 07252925 Nitrogen-containing organic compound, resist composition and patterning process US Patent 7252925 Nitrogen-containing organic compound, resist composition and patterning process
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Patent Number
072529250
Patent Number
72529250
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Patent Jurisdiction
Patent Number
072529250
Date of Patent
August 7, 2007
0Patent Application Number
109747590
Date Filed
October 28, 2004
0Official Website
Patent Primary Examiner
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US Patent 07252925 Nitrogen-containing organic compound, resist composition and patterning process
Infobox
Is a
Patent jurisdiction
Patent number
07252925
Date of patent
August 7, 2007
Patent application number
10974759
Date Filed
October 28, 2004
Patent primary examiner
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