US Patent 7258962 Positive-tone radiation-sensitive resin composition
Patent 7258962 was granted and assigned to JSR Corporation on August, 2007 by the United States Patent and Trademark Office.
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Patent Inventor Names
Takayuki Tsuji0
Tomoki Nagai0
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Patent abstract
A positive-tone radiation-sensitive resin composition comprising: (A) a carbazole derivative shown by the following formula (1), (B) a photoacid generator containing a sulfonimide compound and an iodonium salt compound as essential components, and (C) an acid-dissociable group-containing resin which is insoluble or scarcely soluble in alkali, but becomes soluble in alkali when the acid-dissociable group dissociates is disclosed.
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US Patent 07258962 Positive-tone radiation-sensitive resin composition US Patent 7258962 Positive-tone radiation-sensitive resin composition
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Patent Number
072589620
Patent Number
72589620
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Is a
Current Assignee
Patent Jurisdiction
Patent Number
072589620
Date of Patent
August 21, 2007
0Patent Application Number
111173440
Date Filed
April 29, 2005
0Official Website
Patent Primary Examiner
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US Patent 07258962 Positive-tone radiation-sensitive resin composition
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07258962
Date of patent
August 21, 2007
Patent application number
11117344
Date Filed
April 29, 2005
Patent primary examiner
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