Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
October 9, 2007
Patent Application Number
11196191
Date Filed
August 2, 2005
Patent Primary Examiner
Patent abstract
An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.
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