Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Deog-Bae Kim0
Jae-Hyun Kim0
Sang-Jung Kim0
Date of Patent
October 16, 2007
Patent Application Number
11366765
Date Filed
March 2, 2006
Patent Primary Examiner
Patent abstract
A polymer for forming an organic anti-reflective coating layer between an etching layer and a photoresist layer to absorb an exposure light in a photolithography process and a composition comprising the same are disclosed. The polymer for forming an organic anti-reflective coating layer has repeating units represented by
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