US Patent 7282530 Polymer for forming anti-reflective coating layer
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Deog-Bae Kim0
Jae-Hyun Kim0
Sang-Jung Kim0
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Patent abstract
A polymer for forming an organic anti-reflective coating layer between an etching layer and a photoresist layer to absorb an exposure light in a photolithography process and a composition comprising the same are disclosed. The polymer for forming an organic anti-reflective coating layer has repeating units represented by
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US Patent 07282530 Polymer for forming anti-reflective coating layer US Patent 7282530 Polymer for forming anti-reflective coating layer
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Patent Number
07282530
Patent Number
7282530
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US Patent 07282530 Polymer for forming anti-reflective coating layer
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Is a
Patent jurisdiction
Patent number
07282530
Date of patent
October 16, 2007
Patent application number
11366765
Date Filed
March 2, 2006
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