US Patent 7288300 Fullerenes to increase radiation resistance in polymer-based pellicles
Patent 7288300 was granted and assigned to Intel on October, 2007 by the United States Patent and Trademark Office.
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Patent Inventor Names
Alexander Tregub0
Susan Holl0
Tim T. Chen0
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Patent abstract
A pellicle made of a polymer material contains fullerenes within the polymer material to reduce the damaging effects of radiation that is transmitted through the pellicle during an exposure operation. The fullerenes may comprise nanotubes and/or buckyballs. The buckyballs may also enclose molecules of a gas that further reduce the damaging effects of the radiation on the polymer material.
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US Patent 07288300 Fullerenes to increase radiation resistance in polymer-based pellicles US Patent 7288300 Fullerenes to increase radiation resistance in polymer-based pellicles
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Patent Number
072883000
Patent Number
72883000
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Current Assignee
Patent Jurisdiction
Patent Number
072883000
Date of Patent
October 30, 2007
0Patent Application Number
112264890
Date Filed
September 13, 2005
0Official Website
Patent Primary Examiner
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US Patent 07288300 Fullerenes to increase radiation resistance in polymer-based pellicles
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07288300
Date of patent
October 30, 2007
Patent application number
11226489
Date Filed
September 13, 2005
Patent primary examiner
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