Patent 7291508 was granted and assigned to Intel on November, 2007 by the United States Patent and Trademark Office.
A P-type diffusion diode is used as a probe point for an infrared laser probing system. The P-type diffusion diode probe point may be formed on a semiconductor substrate and connected to an integrated circuit thereon. The P-type diffusion diode probe point may result in higher signal-to-noise ratios in testing of integrated circuits at lower voltages.