US Patent 7294585 Compositions for preparing low dielectric materials
Patent 7294585 was granted and assigned to AIR PRODUCTS AND CHEMICALS, INC. on November, 2007 by the United States Patent and Trademark Office.
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Patent abstract
Low dielectric materials and films comprising same have been identified for improved performance when used as performance materials, for example, in interlevel dielectrics integrated circuits as well as methods for making same. In one aspect of the present invention, the performance of the dielectric material may be improved by controlling the weight percentage of ethylene oxide groups in the at least one porogen.
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US Patent 07294585 Compositions for preparing low dielectric materials US Patent 7294585 Compositions for preparing low dielectric materials
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Patent Number
0729458500
Patent Number
729458500
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Infobox
Is a
Current Assignee
0
Patent Jurisdiction
Patent Number
072945850
Date of Patent
November 13, 2007
0Patent Application Number
114840490
Date Filed
July 11, 2006
0Official Website
Patent Primary Examiner
Edits on 24 Sep, 2022
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Infobox
Is a
Current Assignee
0
Patent Jurisdiction
Patent Number
072945850
Date of Patent
November 13, 2007
0Patent Application Number
114840490
Date Filed
July 11, 2006
0Official Website
Patent Primary Examiner
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US Patent 07294585 Compositions for preparing low dielectric materials
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07294585
Date of patent
November 13, 2007
Patent application number
11484049
Date Filed
July 11, 2006
Patent primary examiner
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