Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Jae Chang Jung0
Young Sun Hwang0
Date of Patent
November 27, 2007
0Patent Application Number
107190830
Date Filed
November 21, 2003
0Patent Primary Examiner
Patent abstract
A method of forming a fine pattern by a tri-layer resist process to overcome a bi-layer resist process is disclosed. When a fine pattern is formed using a silicon photoresist, a gas protection film is coated on a photoresist to prevent exhaustion of silicon gas generated from the photoresist in light examination of high energy. As a result, lens of exposure equipment may be prevented from being contaminated.
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