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US Patent 7306882 Phase shift mask including a substrate with recess

Patent 7306882 was granted and assigned to Renesas Technology Corp on December, 2007 by the United States Patent and Trademark Office.

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Patent abstract

A phase shift mask includes a quartz substrate having a main surface partially dug, and a Cr film deposited on the main surface. The dug portion includes an undercut provided such that the Cr film partially serves as an eaves, and the Cr film has a π opening exposing a portion of the dug portion, and a first subopening exposing an end of the dug portion.

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