US Patent 7306882 Phase shift mask including a substrate with recess
Patent 7306882 was granted and assigned to Renesas Technology Corp on December, 2007 by the United States Patent and Trademark Office.
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Patent Inventor Names
Satoshi Aoyama0
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Patent abstract
A phase shift mask includes a quartz substrate having a main surface partially dug, and a Cr film deposited on the main surface. The dug portion includes an undercut provided such that the Cr film partially serves as an eaves, and the Cr film has a π opening exposing a portion of the dug portion, and a first subopening exposing an end of the dug portion.
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US Patent 07306882 Phase shift mask including a substrate with recess US Patent 7306882 Phase shift mask including a substrate with recess
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Patent Number
073068820
Patent Number
73068820
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Is a
Current Assignee
0
Patent Jurisdiction
Patent Number
073068820
Date of Patent
December 11, 2007
0Patent Application Number
111332330
Date Filed
May 20, 2005
0Official Website
Patent Primary Examiner
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US Patent 07306882 Phase shift mask including a substrate with recess
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07306882
Date of patent
December 11, 2007
Patent application number
11133233
Date Filed
May 20, 2005
Patent primary examiner
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