Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Ronald John Kuse0
Date of Patent
December 11, 2007
0Patent Application Number
106748830
Date Filed
September 30, 2003
0Patent Primary Examiner
Patent abstract
A variable temperature and/or reactant dose atomic layer deposition (VTD-ALD) process modulates ALD reactor conditions (e.g., temperature, flow rates, etc.) during growth of a film (e.g., metallic) on a wafer to produce different film properties a different film depths.
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