US Patent 7306956 Variable temperature and dose atomic layer deposition
Patent 7306956 was granted and assigned to Intel on December, 2007 by the United States Patent and Trademark Office.
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Patent Inventor Names
Ronald John Kuse0
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Patent abstract
A variable temperature and/or reactant dose atomic layer deposition (VTD-ALD) process modulates ALD reactor conditions (e.g., temperature, flow rates, etc.) during growth of a film (e.g., metallic) on a wafer to produce different film properties a different film depths.
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US Patent 07306956 Variable temperature and dose atomic layer deposition US Patent 7306956 Variable temperature and dose atomic layer deposition
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Patent Number
073069560
Patent Number
73069560
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Patent Jurisdiction
Patent Number
073069560
Date of Patent
December 11, 2007
0Patent Application Number
106748830
Date Filed
September 30, 2003
0Official Website
Patent Primary Examiner
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US Patent 07306956 Variable temperature and dose atomic layer deposition
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07306956
Date of patent
December 11, 2007
Patent application number
10674883
Date Filed
September 30, 2003
Patent primary examiner
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