Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Michel Franciscus Johannes Van Rooy0
Patrick Wong0
Johannes Anna Quaedackers0
Koen Van Ingen Schenau0
Date of Patent
December 11, 2007
0Patent Application Number
113786340
Date Filed
March 20, 2006
0Patent Primary Examiner
Patent abstract
An immersion lithographic apparatus provides an immersion liquid including photosensitive material(s) configured to form a patterned film on the surface of a substrate on exposure to a radiation beam. Irradiation through the immersion liquid onto a substrate leads to deposition of a film on the substrate. Film formation occurs only in the photoirradiated region, so that the film formed has a pattern corresponding to the pattern of the radiation.
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