US Patent 7307687 Lithographic apparatus, device manufacturing method and substrate
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Patent Inventor Names
Johannes Anna Quaedackers0
Koen Van Ingen Schenau0
Michel Franciscus Johannes Van Rooy0
Patrick Wong0
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Patent abstract
An immersion lithographic apparatus provides an immersion liquid including photosensitive material(s) configured to form a patterned film on the surface of a substrate on exposure to a radiation beam. Irradiation through the immersion liquid onto a substrate leads to deposition of a film on the substrate. Film formation occurs only in the photoirradiated region, so that the film formed has a pattern corresponding to the pattern of the radiation.
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US Patent 07307687 Lithographic apparatus, device manufacturing method and substrate US Patent 7307687 Lithographic apparatus, device manufacturing method and substrate
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Patent Number
073076870
Patent Number
73076870
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Patent Jurisdiction
Patent Number
073076870
Date of Patent
December 11, 2007
0Patent Application Number
113786340
Date Filed
March 20, 2006
0Official Website
Patent Primary Examiner
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US Patent 07307687 Lithographic apparatus, device manufacturing method and substrate
Infobox
Is a
Patent jurisdiction
Patent number
07307687
Date of patent
December 11, 2007
Patent application number
11378634
Date Filed
March 20, 2006
Patent primary examiner
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