Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
December 25, 2007
Patent Application Number
10480794
Date Filed
June 21, 2002
Patent Primary Examiner
Patent abstract
The present invention relates to a resist composition for practical use with high resolution, high sensitivity, superior pattern profile and no outgas in energy irradiation under high vacuum, suitable to an ultra-fine processing technology represented by use of electron beam and the like, and provides: (1) a resist composition comprising at least one kind of polymer containing, as components thereof, a monomer unit represented by the following general formula [1]:
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