US Patent 7312014 Resist compositions
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Patent abstract
The present invention relates to a resist composition for practical use with high resolution, high sensitivity, superior pattern profile and no outgas in energy irradiation under high vacuum, suitable to an ultra-fine processing technology represented by use of electron beam and the like, and provides: (1) a resist composition comprising at least one kind of polymer containing, as components thereof, a monomer unit represented by the following general formula [1]:
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US Patent 07312014 Resist compositions US Patent 7312014 Resist compositions
Infobox
Patent Number
0731201400
Patent Number
731201400
Edits on 31 Mar, 2023
Golden AI
Infobox
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Patent Jurisdiction
Patent Number
073120140
Date of Patent
December 25, 2007
0Patent Application Number
104807940
Date Filed
June 21, 2002
0Official Website
Patent Primary Examiner
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Infobox
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Patent Jurisdiction
Patent Number
073120140
Date of Patent
December 25, 2007
0Patent Application Number
104807940
Date Filed
June 21, 2002
0Official Website
Patent Primary Examiner
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US Patent 07312014 Resist compositions
Infobox
Is a
Patent jurisdiction
Patent number
07312014
Date of patent
December 25, 2007
Patent application number
10480794
Date Filed
June 21, 2002
Patent primary examiner
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