Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
January 15, 2008
Patent Application Number
10421740
Date Filed
April 24, 2003
Patent Primary Examiner
Patent abstract
A cleaning method for a semiconductor substrate including placing the semiconductor substrate into a cleaning chamber and injecting ozone gas (O3) into the cleaning chamber. This process operates to cleanse the semiconductor substrate without corrosion or etching of the semiconductor substrate; even when the substrate has metal layer made of tungsten.
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