US Patent 7320855 Silicon containing TARC/barrier layer
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Patent Inventor Names
Pushkara Rao Varanasi0
Sean D. Burns0
Wu-Song S. Huang0
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Patent abstract
A top anti-reflective coating material (TARC) and barrier layer, and the use thereof in lithography processes, is disclosed. The TARC/barrier layer may be especially useful for immersion lithography using water as the imaging medium. The TARC/barrier layer comprises a polymer which comprises at least one silicon-containing moiety and at least one aqueous base soluble moiety. Suitable polymers include polymers having a silsesquioxane (ladder or network) structure, such as polymers containing monomers having the structure:
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US Patent 07320855 Silicon containing TARC/barrier layer US Patent 7320855 Silicon containing TARC/barrier layer
Infobox
Patent Number
073208550
Patent Number
73208550
Edits on 5 Apr, 2023
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Patent Jurisdiction
Patent Number
073208550
Date of Patent
January 22, 2008
0Patent Application Number
109803650
Date Filed
November 3, 2004
0Official Website
Patent Primary Examiner
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US Patent 07320855 Silicon containing TARC/barrier layer
Infobox
Is a
Patent jurisdiction
Patent number
07320855
Date of patent
January 22, 2008
Patent application number
10980365
Date Filed
November 3, 2004
Patent primary examiner
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