Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
January 29, 2008
0Patent Application Number
109263760
Date Filed
August 25, 2004
0Patent Primary Examiner
Patent abstract
Improved apparatus for imprint lithography involves using direct fluid pressure to press a mold into a substrate-supported film. Advantageously the mold and/or substrate are sufficiently flexible to provide wide area contact under the fluid pressure. Fluid pressing can be accomplished by sealing the mold against the film and disposing the resulting assembly in a pressurized chamber. The result of this fluid pressing is enhanced resolution and high uniformity over an enlarged area.
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