US Patent 7329174 Method of manufacturing chemical mechanical polishing pad

Patent 7329174 was granted and assigned to JSR Corporation on February, 2008 by the United States Patent and Trademark Office.

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Patent

Patent attributes

Current Assignee

JSR Corporation

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

7329174

Date of Patent

February 12, 2008

Patent Application Number

11521547

Date Filed

September 15, 2006

Patent Citations Received

‌

US Patent 11980990 Method for machining a workpiece in the production of an optical element

Patent Primary Examiner

‌

Eileen P. Morgan

Patent abstract

The present invention relates to a method of manufacturing a chemical mechanical polishing pad which provides a chemical mechanical polishing pad which fully suppresses the occurrence of a scratch on the polished surface and has an excellent polishing rate.

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