US Patent 7329174 Method of manufacturing chemical mechanical polishing pad
Patent 7329174 was granted and assigned to JSR Corporation on February, 2008 by the United States Patent and Trademark Office.
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Patent abstract
The present invention relates to a method of manufacturing a chemical mechanical polishing pad which provides a chemical mechanical polishing pad which fully suppresses the occurrence of a scratch on the polished surface and has an excellent polishing rate.
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US Patent 07329174 Method of manufacturing chemical mechanical polishing pad US Patent 7329174 Method of manufacturing chemical mechanical polishing pad
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Patent Number
0732917400
Patent Number
732917400
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Is a
Current Assignee
Patent Jurisdiction
Patent Number
073291740
Date of Patent
February 12, 2008
0Patent Application Number
115215470
Date Filed
September 15, 2006
0Official Website
Patent Primary Examiner
Edits on 27 Sep, 2022
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
073291740
Date of Patent
February 12, 2008
0Patent Application Number
115215470
Date Filed
September 15, 2006
0Official Website
Patent Primary Examiner
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US Patent 07329174 Method of manufacturing chemical mechanical polishing pad
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07329174
Date of patent
February 12, 2008
Patent application number
11521547
Date Filed
September 15, 2006
Patent primary examiner
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