Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Hongyou Fan0
Dhaval Doshi0
Nicola Huesing0
Alan Hurd0
Charles Jeffrey Brinker0
Date of Patent
February 19, 2008
0Patent Application Number
103735650
Date Filed
February 26, 2003
0Patent Primary Examiner
Patent abstract
The present invention provides a mesoporous material comprising at least one region of mesoporous material patterned at a lithographic scale. The present invention also provides a method for forming a patterned mesoporous material comprising: coating a sol on a substrate to form a film, the sol comprising: at least one photoactivator generator, at least one material capable of being sol-gel processed; and exposing the film to light to form a patterned mesoporous material.
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