US Patent 7332264 Photo-definable self-assembled materials
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Patent Inventor Names
Alan Hurd0
Charles Jeffrey Brinker0
Dhaval Doshi0
Hongyou Fan0
Nicola Huesing0
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Patent abstract
The present invention provides a mesoporous material comprising at least one region of mesoporous material patterned at a lithographic scale. The present invention also provides a method for forming a patterned mesoporous material comprising: coating a sol on a substrate to form a film, the sol comprising: at least one photoactivator generator, at least one material capable of being sol-gel processed; and exposing the film to light to form a patterned mesoporous material.
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US Patent 07332264 Photo-definable self-assembled materials US Patent 7332264 Photo-definable self-assembled materials
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Patent Number
073322640
Patent Number
73322640
Edits on 24 Sep, 2022
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Patent Jurisdiction
Patent Number
073322640
Date of Patent
February 19, 2008
0Patent Application Number
103735650
Date Filed
February 26, 2003
0Official Website
Patent Primary Examiner
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US Patent 07332264 Photo-definable self-assembled materials
Infobox
Is a
Patent jurisdiction
Patent number
07332264
Date of patent
February 19, 2008
Patent application number
10373565
Date Filed
February 26, 2003
Patent primary examiner
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