US Patent 7335256 Silicon single crystal, and process for producing it
Patent 7335256 was granted and assigned to Siltronic on February, 2008 by the United States Patent and Trademark Office.
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Patent abstract
A silicon single crystal which, over an ingot length of over 10 percent of the total ingot length, has a uniform defect picture and narrow radial dopant and oxygen variations. The process in accordance with the Czochralski method involves bringing about a temperature distribution in the melt in the region of the solidification interface which deviates from rotational symmetry.
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US Patent 07335256 Silicon single crystal, and process for producing it US Patent 7335256 Silicon single crystal, and process for producing it
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Patent Number
0733525600
Patent Number
733525600
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Official Website
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
073352560
Date of Patent
February 26, 2008
0Patent Application Number
114876690
Date Filed
July 17, 2006
0Official Website
Patent Primary Examiner
Edits on 28 Sep, 2022
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
073352560
Date of Patent
February 26, 2008
0Patent Application Number
114876690
Date Filed
July 17, 2006
0Official Website
Patent Primary Examiner
Edits on 17 Jun, 2022
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US Patent 07335256 Silicon single crystal, and process for producing it
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07335256
Date of patent
February 26, 2008
Patent application number
11487669
Date Filed
July 17, 2006
Patent primary examiner
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