Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Raj Sakamuri0
Ralph R. Dammel0
Francis M. Houlihan0
Date of Patent
April 1, 2008
0Patent Application Number
117163610
Date Filed
March 9, 2007
0Patent Primary Examiner
Patent abstract
The present invention relates to a photoresist composition comprising a photoacid generator and at least one polymer comprising at least one unit as described by structure 1,
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
