US Patent 7351521 Photoresist composition for deep ultraviolet lithography
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Patent Inventor Names
Francis M. Houlihan0
Raj Sakamuri0
Ralph R. Dammel0
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Patent abstract
The present invention relates to a photoresist composition comprising a photoacid generator and at least one polymer comprising at least one unit as described by structure 1,
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US Patent 07351521 Photoresist composition for deep ultraviolet lithography US Patent 7351521 Photoresist composition for deep ultraviolet lithography
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Patent Number
073515210
Patent Number
73515210
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Patent Jurisdiction
Patent Number
073515210
Date of Patent
April 1, 2008
0Patent Application Number
117163610
Date Filed
March 9, 2007
0Official Website
Patent Primary Examiner
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US Patent 07351521 Photoresist composition for deep ultraviolet lithography
Infobox
Is a
Patent jurisdiction
Patent number
07351521
Date of patent
April 1, 2008
Patent application number
11716361
Date Filed
March 9, 2007
Patent primary examiner
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