Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
April 8, 2008
Patent Application Number
11435285
Date Filed
May 17, 2006
Patent Primary Examiner
Patent abstract
A method of manufacturing a field emission device (FED) using a photoresist for performing multi-patterning processes, whereby different structures can be multi-patterned using a single photoresist mask. The photoresist has a solubility to a solvent by post-exposure heat-treatment, and a complicated structure can be formed using the photoresist.
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