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US Patent 7368207 Dynamic compensation system for maskless lithography

Patent 7368207 was granted and assigned to Eastman Kodak on May, 2008 by the United States Patent and Trademark Office.

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Patent abstract

A method for dynamically registering multiple patterned layers on a substrate (3) comprises: depositing a first layer on the substrate; printing a first pattern (20) on the first layer; depositing a second layer on the first pattern; and printing a second pattern on the second layer while dynamically detecting the first pattern to align the second pattern with the first pattern.

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