US Patent 7368207 Dynamic compensation system for maskless lithography
Patent 7368207 was granted and assigned to Eastman Kodak on May, 2008 by the United States Patent and Trademark Office.
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Patent Inventor Names
Andrea S. Rivers0
James T. Stoops0
Joshua M. Cobb0
Robert H. Cuffney0
Timothy J. Tredwell0
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Patent abstract
A method for dynamically registering multiple patterned layers on a substrate (3) comprises: depositing a first layer on the substrate; printing a first pattern (20) on the first layer; depositing a second layer on the first pattern; and printing a second pattern on the second layer while dynamically detecting the first pattern to align the second pattern with the first pattern.
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US Patent 07368207 Dynamic compensation system for maskless lithography US Patent 7368207 Dynamic compensation system for maskless lithography
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Patent Number
073682070
Patent Number
73682070
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Current Assignee
Patent Jurisdiction
Patent Number
073682070
Date of Patent
May 6, 2008
0Patent Application Number
113961670
Date Filed
March 31, 2006
0Official Website
Patent Primary Examiner
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US Patent 07368207 Dynamic compensation system for maskless lithography
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07368207
Date of patent
May 6, 2008
Patent application number
11396167
Date Filed
March 31, 2006
Patent primary examiner
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