US Patent 7374858 Polymerizable compositions; polymer, resist, and lithography method

Patent 7374858 was granted and assigned to Qimonda on May, 2008 by the United States Patent and Trademark Office.

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Patent

Patent attributes

Current Assignee

Qimonda

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

73748580

Patent Inventor Names

Klaus Elian0

Date of Patent

May 20, 2008

Patent Application Number

105205340

Date Filed

July 21, 2003

Patent Primary Examiner

‌

Geraldina Visconti

Patent abstract

A polymerizable composition for the production of a resist includes at least one unsaturated, polymerizable monomer. This monomer has at least one silicon atom and at least one carbonyl group.

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