US Patent 7374858 Polymerizable compositions; polymer, resist, and lithography method
Patent 7374858 was granted and assigned to Qimonda on May, 2008 by the United States Patent and Trademark Office.
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Patent Inventor Names
Klaus Elian0
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Patent abstract
A polymerizable composition for the production of a resist includes at least one unsaturated, polymerizable monomer. This monomer has at least one silicon atom and at least one carbonyl group.
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US Patent 07374858 Polymerizable compositions; polymer, resist, and lithography method US Patent 7374858 Polymerizable compositions; polymer, resist, and lithography method
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Patent Number
073748580
Patent Number
73748580
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Current Assignee
Patent Jurisdiction
Patent Number
073748580
Date of Patent
May 20, 2008
0Patent Application Number
105205340
Date Filed
July 21, 2003
0Official Website
Patent Primary Examiner
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US Patent 07374858 Polymerizable compositions; polymer, resist, and lithography method
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07374858
Date of patent
May 20, 2008
Patent application number
10520534
Date Filed
July 21, 2003
Patent primary examiner
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