Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Ronaldo D. Mansano0
Luiz Goncalves Neto0
Luiz S. Zambom0
Patrick B. Verdonck0
Giuseppe A. Cirino0
Date of Patent
June 3, 2008
Patent Application Number
10487031
Date Filed
May 8, 2002
Patent Primary Examiner
Patent abstract
The present invention concerns an improved process for the deposition of amorphous hydrogenated carbon film, more specifically an improved low temperature, low power and low vacuum cathodic sputtering process. The invention also concerns the film produced by said process and articles containing an amorphous hydrogenated carbon film coating.
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