Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Inno Lee0
Date of Patent
June 10, 2008
Patent Application Number
11167221
Date Filed
June 28, 2005
Patent Primary Examiner
Patent abstract
A method of fabricating semiconductor devices. Upon formation of a trench for isolation in a cell region, a hard mask film is used as an etch mask. It is thus possible to prevent attacks of a lower layer due to deformation or loss of the etch mask.
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