US Patent 7384846 Method of fabricating semiconductor device
All edits
Edits on 16 Sep, 2023
Golden AI
Edits made to:
Infobox (+1 properties)
Infobox
Patent Inventor Names
Inno Lee0
Edits on 14 Sep, 2023
Golden AI
Edits made to:
Article (+263 characters)
Article
Patent abstract
A method of fabricating semiconductor devices. Upon formation of a trench for isolation in a cell region, a hard mask film is used as an etch mask. It is thus possible to prevent attacks of a lower layer due to deformation or loss of the etch mask.
Edits on 21 May, 2023
Golden AI
Edits made to:
Infobox (-1 properties)
Infobox
Official Website
Edits on 21 May, 2023
Golden AI
Edits made to:
Infobox (+1/-1 properties)
US Patent 07384846 Method of fabricating semiconductor device US Patent 7384846 Method of fabricating semiconductor device
Infobox
Patent Number
07384846
Patent Number
7384846
Edits on 9 Jun, 2022
Golden AI
Edits made to:
Infobox (+1 properties)
Infobox
Website URL
Edits on 30 Nov, 2021
Golden AI
Edits made to:
Infobox (+7 properties)
US Patent 07384846 Method of fabricating semiconductor device
Infobox
Is a
Patent jurisdiction
Patent number
07384846
Date of patent
June 10, 2008
Patent application number
11167221
Date Filed
June 28, 2005
Patent primary examiner
Find more entities like US Patent 7384846 Method of fabricating semiconductor device
Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.
