Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Terence M. Thomas0
Joseph K. So0
Date of Patent
June 17, 2008
0Patent Application Number
104548770
Date Filed
June 5, 2003
0Patent Primary Examiner
Patent abstract
A cleaning solution for removing copper complex residues from the surface of polishing pads and wafer substrates includes an amine pH-adjusting agent, which can be a unidentate or bidentate amine compound or a quartnary ammonium hydroxide compound or an amine including an alcohol group. The cleaning solution also includes an amino acid complexing agent and an inhibitor. In a preferred embodiment, the cleaning solution has a basic pH.
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