US Patent 7390365 Developing method, substrate treating method, and substrate treating apparatus
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Patent Inventor Names
Hideaki Sakurai0
Ikuo Yoneda0
Masamitsu Itoh0
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Patent abstract
A developing method comprises determining in advance the relation of resist dissolution concentration in a developing solution and resist dissolution speed by the developing solution, estimating in advance the resist dissolution concentration where the resist dissolution speed is a desired speed or more from the relation, and developing in a state in which the resist dissolution concentration in the developing solution is the estimated dissolution concentration or less.
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US Patent 07390365 Developing method, substrate treating method, and substrate treating apparatus US Patent 7390365 Developing method, substrate treating method, and substrate treating apparatus
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Patent Number
07390365
Patent Number
7390365
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US Patent 07390365 Developing method, substrate treating method, and substrate treating apparatus
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Patent jurisdiction
Patent number
07390365
Date of patent
June 24, 2008
Patent application number
10969017
Date Filed
October 21, 2004
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