US Patent 7391226 Contact resistance test structure and methods of using same

The present invention is directed to a contact resistance test structure and methods of using same. In one illustrative embodiment, the method includes forming a test structure comprised of two gate electrode structures, forming a plurality of conductive contacts to a doped region between the two gate electrode structures, forcing a current through the test structure and determining a resistance of at least one of the conductive contacts based upon, in part, the forced current.