Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
July 1, 2008
Patent Application Number
10715433
Date Filed
November 19, 2003
Patent Primary Examiner
Patent abstract
After forming a resist film including a hygroscopic compound, pattern exposure is performed by selectively irradiating the resist film with exposing light while supplying water onto the resist film. After the pattern exposure, the resist film is developed so as to form a resist pattern.
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