US Patent 7393794 Pattern formation method
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Patent abstract
After forming a resist film including a hygroscopic compound, pattern exposure is performed by selectively irradiating the resist film with exposing light while supplying water onto the resist film. After the pattern exposure, the resist film is developed so as to form a resist pattern.
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US Patent 07393794 Pattern formation method US Patent 7393794 Pattern formation method
Infobox
Patent Number
0739379400
Patent Number
739379400
Edits on 4 Apr, 2023
Golden AI
Infobox
Is a
Patent Jurisdiction
Patent Number
073937940
Date of Patent
July 1, 2008
0Patent Application Number
107154330
Date Filed
November 19, 2003
0Official Website
Patent Primary Examiner
Edits on 23 Sep, 2022
Golden AI
Infobox
Is a
Patent Jurisdiction
Patent Number
073937940
Date of Patent
July 1, 2008
0Patent Application Number
107154330
Date Filed
November 19, 2003
0Official Website
Patent Primary Examiner
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US Patent 07393794 Pattern formation method
Infobox
Is a
Patent jurisdiction
Patent number
07393794
Date of patent
July 1, 2008
Patent application number
10715433
Date Filed
November 19, 2003
Patent primary examiner
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